摘要：The main purpose of this study is to develop a XYθZ 3-DOF nanopositioning stage with linear displacement amplification device. This stage is used by three groups of linear displacement amplification device to composition, and thus achieves precise XYθZ 3-DOF movement. The linear displacement amplification device makes use of a symmetrical layer mechanism, toggle amplification mechanism and parallel guiding spring to composition, and with amplification capability. Then it uses an equilateral triangle way to set the three groups of linear displacement amplification device. Overall design uses the finite element software ANSYS 12.0 to analysis the displacement, stress and dynamic response of nanopositioning stage. Experiment demonstrated takes the laser interferometer as the standard of displacement measurement. The result of experiment measurement shows that the maximum XY axis displacement and θZ rotational angle travel of the stage is 36.5 μm, 32 μm and 265 arc sec.
