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  • 标题:An Application of Incremental Scheduling to a Cluster Photolithography Tool
  • 本地全文:下载
  • 作者:First S. Ware ; Second R. Su
  • 期刊名称:IFAC PapersOnLine
  • 印刷版ISSN:2405-8963
  • 出版年度:2017
  • 卷号:50
  • 期号:1
  • 页码:1114-1120
  • DOI:10.1016/j.ifacol.2017.08.393
  • 语种:English
  • 出版社:Elsevier
  • 摘要:AbstractOptimization is an important area of research. As many optimization problems are NP-Hard it is important to have a wide selection of heuristic approaches to choose from when solving problems. Prioritized planning is a technique traditionally used to solve the multi-robot path planning problem. In this paper we investigate how incremental scheduling, a technique based upon prioritized planning can be applied to scheduling wafer processing in a cluster tool. For our test case our approach is shown to be capable of finding a plan of equal quality to other scheduling approaches and thus suggests our method could be of potential use in other manufacturing/material handling applications.
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