摘要：To study the influence of the electron beam radius on the deposition parameters in dielectric under high energy electron irradiation, a model of dielectric irradiated by plane electron beam source was established. Monte Carlo simulation method was used to calculate the distribution of the injection current density, injection charge density, dose rate and radiation induced conductivity in the dielectric layer of Teflon after electron irradiation with different energies and different beam radii. The results show that the radius of the electron beam source has little influence on the distribution trend of the injection current density in the dielectric layer, as well as the peak position of the injection charge density and the dose rate, but it will significantly affect the peak value of injection charge density and the dose rate. When the electron beam radius is smaller than the dielectric layer radius, the calculated peak is higher than that of the electron beam completely covering the dielectric layer. The higher the electron energy is, the greater the relative deviation will be.
