摘要：An automated thin film formation technique is developed using the microcontroller PIC16F877for NiO film formation at low temperatures for different molarities. Then the formed films wereannealed at 310oC to get better crystalline structure. The Structural and optical properties werestudied for the grown thin films with the developed instrument. The band gap of the formed thinfilms is in the range of 3.73 eV to 3.35 eV. The optical studies revealed that the transmittance ofthe grown film is upto 80 % and decreases with increase of molarity of the solution. The designscheme of the developed instrument is also discussed.
