期刊名称：Current Journal of Applied Science and Technology
印刷版ISSN：2457-1024
出版年度：2015
卷号：7
期号：3
页码：263-279
语种：English
出版社：Sciencedomain International
摘要：In this work, a DC planar sputtering system has been successfully designed, manufactured and assembled. The glow discharge plasma chamber was made of stainless steel with a length of 40.5 cm and a diameter of 28 cm. This chamber consists of two Co- planar sputtering magnetrons adapted with copper and Aluminum targets each of diameter of 4.8 cm. The systems have been tested with the pressure of 6x10-5 mbar. The plasma parameters like electron temperature Te, electrons density ne, ions density ni, plasma potential VP and floating potential VF were measured using single Langmuir probe with different gas pressures and distances between the electrodes. It is found that the electron temperature decreases and electron density increased with increasing the argon gas pressure and varying distance between electrodes.
