摘要：This paper proposes a new thermal contact resistance measurement method using lock-in thermography. By the lock-in thermography with an infrared microscope, the dynamic temperature behavior across the contact interface was visualized in the sample side surface. Meanwhile, a new thermal contact resistance measurement principle was constructed by the superimposition of the temperature wave from virtual heat sources in consideration of the thermal contact resistance at the interface. Consequently, the thermal contact resistance was obtained as a fitting parameter by fitting the theoretical curve to the measured amplitude and phase lag. The validity of the principle was shown.
