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  • 标题:Design and manufacturing of a multi-zone phase-shifting coronagraph mask for extremely large telescopes
  • 本地全文:下载
  • 作者:P. Martinez ; M. Beaulieu ; K. Barjot
  • 期刊名称:Astronomy & Astrophysics
  • 印刷版ISSN:0004-6361
  • 电子版ISSN:1432-0746
  • 出版年度:2020
  • 卷号:635
  • 页码:1-11
  • DOI:10.1051/0004-6361/201936903
  • 语种:English
  • 出版社:EDP Sciences
  • 摘要:Context.High-contrast imaging of exoplanets around nearby stars with future large-segmented apertures requires starlight suppression systems optimized for complex aperture geometries. Future extremely large telescopes (ELTs) equipped with high-contrast instruments operating as close as possible to the diffraction limit will open a bulk of targets in the habitable zone around M-stars. In this context, the phase-induced amplitude apodization complex mask coronagraph (PIAACMC) is a promising concept for high-efficiency coronagraphic imaging at small angular separations with segmented telescopes.Aims.The complex focal plane mask of the PIAACMC is a multi-zone, phase-shifting mask comprised of tiled hexagons that vary in depth. The mask requires micro-fabrication techniques because it is generally made of hundreds micron-scale hexagonal zones with depths ranging over a few microns. We aim to demonstrate that the complex focal plane mask of a PIAACMC with a small inner working angle can be designed and manufactured for segmented apertures.Methods.We report on the numerical design, specifications, manufacturing, and characterization of a PIAACMC complex focal plane mask for the segmented pupil experiment for exoplanet detection facility.Results.Our PIAACMC design offers an inner working angle of 1.3λ/Dand is optimized for a 30% telescope-central-obscuration ratio including six secondary support structures (ESO/ELT design). The fabricated reflective focal plane mask is made of 499 hexagons, and the characteristic size of the mask features is 25μm, with depths ranging over ±0.4μm. The mask sag local deviation is measured to an average error of 3 nm and standard deviation of 6 nm rms. The metrological analysis of the mask using interferential microscopy gives access to an in-depth understanding of the component’s optical quality, including a complete mapping of the zone depth distribution zone-depth distribution. The amplitude of the errors in the fabricated mask are within the wavefront control dynamic range.Conclusions.We demonstrate the feasibility of fabricating and characterizing high-quality PIAA complex focal plane masks.
  • 关键词:eninstrumentation: high angular resolutiontechniques: high angular resolution
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