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  • 标题:Characteristics investigation on 4.5kV IGBT with partially narrow mesa and split-gate
  • 本地全文:下载
  • 作者:Xuebing Zhai ; Tong Yang ; Ruliang Zhang
  • 期刊名称:E3S Web of Conferences
  • 印刷版ISSN:2267-1242
  • 电子版ISSN:2267-1242
  • 出版年度:2021
  • 卷号:300
  • 页码:1-6
  • DOI:10.1051/e3sconf/202130001012
  • 语种:English
  • 出版社:EDP Sciences
  • 摘要:Low on-state voltage and low turn-off loss are key issues for IGBT used in HVDC and FACTS. Partial narrow mesa was introduced to improve emitter side contact resistance of IGBT based on Nakagawa limit assumption. However, turn-off loss increases and short circuit sustainability get worse. Split gate separates gate electrode from drift region and reduces gate-collector capacitance to lower turn-off energy loss. Combination partial narrow mesa with split gate can get better gate performance and turn-off characteristics in 4.5kV IGBT. Simulated results with TCAD show proposed models improves switching loss and gate reliability. By adjusting split gap electric filed, split gate shape has an important effect on turn-on characteristics.
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