文章基本信息

标题：Author Correction: Influence of plasma treatment on SiO ₂/Si and Si ₃N ₄/Si substrates for large-scale transfer of graphene
本地全文：下载
作者：R. Lukose ; M. Lisker ; F. Akhtar 等
期刊名称：Scientific Reports
电子版ISSN：2045-2322
出版年度：2021
卷号：11
DOI：10.1038/s41598-021-96605-z
语种：English
出版社：Springer Nature
摘要：Correction to: Scientific Reports 10.1038/s41598-021-92432-4, published online 23 June 2021 The original version of this Article omitted an affiliation for M. Lisker. The correct affiliations for M. Lisker are listed below: IHP- Leibniz Institut für innovative Mikroelektronik, Im Technologiepark 25, 15236, Frankfurt (Oder), Germany Technical University of Applied Science Wildau, Hochschulring 1, 15745, Wildau, Germany The original Article and accompanying Supplementary Information file have been corrected.