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  • 标题:Key technologies and international trends in EDA field of digital IC design: a patent analysis
  • 本地全文:下载
  • 作者:Weihui Li ; Haoyu Wen ; Peiji Duan
  • 期刊名称:SHS Web of Conferences
  • 印刷版ISSN:2416-5182
  • 电子版ISSN:2261-2424
  • 出版年度:2022
  • 卷号:140
  • 页码:1-5
  • DOI:10.1051/shsconf/202214001020
  • 语种:English
  • 出版社:EDP Sciences
  • 摘要:Currently, Electronics Design Automation (EDA) software tools are highly monopolized internationally. In China, EDA suffers from the pain of “stuck neck”. This paper will find out the key technologies in the EDA field through 3D sand table clustering algorithm, and analyze a series of patent data of monopoly three companies (Synopsys, Cadence, Mentor Graphic), in order to help local EDA enterprises perceive the technology status and development trend of the international EDA field.
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