摘要：The main objective of this paper is to propose, design, and control a novel dual servo magnetic levitation stage which is precise and vacuum compatible. The dual servo mechanism, comprising a coarse stage and a fine stage, was applied to a magnetic levitation stage system for the first time. The dual servo stage achieves high precision and a long stroke at the same time. The fine stage, which comprises voice coil motors, achieves high-precision motion by overcoming the limit of the coarse stage, the form of which is a planar motor. The planar motor was mathematically modeled and analyzed with respect to the main design parameters, after which the fine stage was optimally designed to be driven by high force. Both stages including a common heat exchanger were manufactured, and the heat exchanger cools down the heat given off from the planar motor and voice coil motors. The position measuring system consisted of laser interferometers and capacitive sensors, and the integrated dual servo stage was controlled with a master–slave control scheme. The experimental results showed a precision of 10 nm, thus confirming the suitability of the developed magnetic levitation stage for a high-precision fabrication process such as wafer lithography.
