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  • 标题:Anisotropy Behavior of Dislocation Nucleation from a Sharp Corner in Copper
  • 本地全文:下载
  • 作者:Yu SUN ; Satoshi IZUMI ; Shotaro HARA
  • 期刊名称:Journal of Computational Science and Technology
  • 电子版ISSN:1881-6894
  • 出版年度:2011
  • 卷号:5
  • 期号:1
  • 页码:54-61
  • DOI:10.1299/jcst.5.54
  • 出版社:The Japan Society of Mechanical Engineers
  • 摘要:By means of reaction pathway analysis, we have investigated the nucleation of 90° and 30° partial dislocation from a sharp corner in an f.c.c. crystal copper. The anisotropy aspects of dislocation nucleation revealed by the results have shown that the stress-dependent activation energy of 30° partial dislocation is approximately twice over the counterpart of 90° partial dislocation, and that the maximum inelastic displacement for the former is also higher. Moreover, the shape of the saddle-point configuration of 30° partial dislocation is similar to a half-ellipse whereas in the case of 90° partial dislocation it is more like a semi-circle, reflecting the different Peierls barriers influenced by the Burgers vectors. Further study of the surface reconstruction demonstrates that although the nucleation of 30° partial dislocation has been enhanced by surface reduction, it is still more energy-unfavorable than the 90° partial dislocation. These results suggest that the higher Peierls barrier is responsible for the larger activation energy of 30° partial dislocation nucleation.
  • 关键词:Dislocation Nucleation;Reaction Pathway Analysis;Molecular Dynamics;Copper;Anisotropy Behavior
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