摘要：In this work, we have investigated the potential dual application of TiO2 thin films as a photocatalyst for ammonia degradation, and as a UV light blocking layer in c-Si photovoltaics. For this purpose, we deposited a series of TiO2 thin films on a glass substrate by reactive magnetron sputtering and analysed the influence of the deposition parameters (O2/Ar working gas content and pressure) on the structural, optical and photocatalytic properties. All samples are nanocrystalline anatase TiO2 and have a uniform surface (RMS roughness < 5 nm) in a wide range of magnetron sputtering deposition parameters. They are transparent in the Vis/NIR spectral range and strongly absorb light in the UV range above the optical bandgap energy (3.3 eV), which makes them suitable for the use as UV blocking layers and photocatalysts. The photocatalytic properties were studied in a mini-photocatalytic wind tunnel reactor by examining ammonia degradation. A kinetic study was performed to estimate the reaction rate constants for all samples. The intrinsic reaction rate constant confirmed the crucial role of surface morphology in ammonia decomposition efficiency.
