文章基本信息
- 标题：アルゴンレーザー感光性ポリマーの合成と感光特性
- 本地全文：下载
- 作者：鉛山 洋一 ; 鷹尾 英俊 ; 木下 堯博 等
- 期刊名称：日本写真学会誌
- 印刷版ISSN：0369-5662
- 电子版ISSN：1884-5932
- 出版年度：1984
- 卷号：47
- 期号：5
- 页码：368-371
- DOI：10.11454/photogrst1964.47.368
- 出版社：The Society of Photographic Science and Technolgy of Japan
- 摘要：
Argon ion laser sensitive polymers were synthesized by the condensation of poly (4-vinylbenzyloxy) acetophenone-co-methacrylic acid [P (4-VBz) Ap-co-MA] with 4-dimethylaminobenzaldehyde or 4 dimethylamino cinnamaldehyde in the presence of alkaline catalyzer, respectively. It is found that poly (4-dimethylamino-4'-vinylbenzyloxy) benzalacetophenone-co-MA [P (4-DiMeAm-4'-(VBz) BAp-co-MA)] and poly (4-dimethylamino-4'-(vinylbenzyloxy) cinnamillidenacetophenone-co-MA) [P (4-DiMeAm-4'-(VBz) CAp-co-MA)] were highly sensitive to the 488 nm line of argon ion laser in air. These condensation copolymers were soluble in commercial developing solution for negative type presensitized plates and can be utilized as a alkaline developable photoresist. The sensitivities to argon ion laser were estimated 39 mJ/cm2 (static conditions), 46 mJ/cm2 (scanning conditions) for P (4-DiMeAm-4'-(VBz) BAp-co-MA) and 22 mJ/cm2 (static conditions), 34 mJ/cm2 (scanning conditions) for P (4-DiMeAm-4'-(VBz) CAp-co-MA), respectively.
