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  • 标题:エキシマーレーザーの画像技術への応用
  • 本地全文:下载
  • 作者:矢部 明
  • 期刊名称:日本写真学会誌
  • 印刷版ISSN:0369-5662
  • 电子版ISSN:1884-5932
  • 出版年度:1986
  • 卷号:49
  • 期号:3
  • 页码:215-226
  • DOI:10.11454/photogrst1964.49.215
  • 出版社:The Society of Photographic Science and Technolgy of Japan
  • 摘要:

    Fundamental principles and characteristics of excimer lasers are described briefly for the chemists working in the field of imaging technology. The applications of excimer lasers to such imaging technology as contact lithography, self-developing lithography (direct dry photoetching lithography), ablative photodecomposition (UV-laser ablation), projection lithography, and producing gratings and printing plates are reviewed.

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