文章基本信息
- 标题：低仕事関数透明導電膜を陰極に用いた透明有機ELの発光と電流注入性の検討
- 本地全文：下载
- 作者：内田 孝幸 ; 落合 俊明 ; 坪川 克秀 等
- 期刊名称：日本写真学会誌
- 印刷版ISSN：0369-5662
- 电子版ISSN：1884-5932
- 出版年度：2005
- 卷号：68
- 期号：Suppliment1
- 页码：126-127
- DOI：10.11454/photogrst1964.68.Suppliment1_126
- 出版社：The Society of Photographic Science and Technolgy of Japan
- 摘要：
For the cathode of Transparent Organic Light Emitting Device (TOLED), ITO film was deposited using RF magnetron sputtering with Cs-vapor introduction during the sputtering process. The work-function of the Cs incorporated ITO film was 4.3 eV with electric conductivity and it was very stable at the atmospheric environment over extended period of time. It was shown that this Cs incorporation technique was effective for the incorporation of Cesium in the ITO film and that it made possible ITO film with low work function
