摘要：High-precision measurements implemented with light are desired in all fields of science. However, light acts as a wave, and the Rayleigh criterion in classical optics yields a diffraction limit that prevents obtaining a resolution smaller than the wavelength. Sub-wavelength interference has potential application in lithography because it beats the classical Rayleigh resolution limit. Here, we carefully study second-order correlation theory to establish the physics behind sub-wavelength interference in photon coincidence detection. A Young's double slit experiment with pseudo-thermal light is performed to test the second-order correlation pattern. The results show that when two point detectors are scanned in different ways, super sub-wavelength interference patterns can be obtained. We then provide a theoretical explanation for this surprising result, and demonstrate that this explanation is also suitable for the results found for entangled light. Furthermore, we discuss the limitations of these types of super sub-wavelength interference patterns in quantum lithography.
