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  • 标题:Effect of Oxygen Binding Energy on the Stability of Indium-Gallium-Zinc-Oxide Thin-Film Transistors
  • 本地全文:下载
  • 作者:Cheong, Woo-Seok ; Park, Jonghyurk ; Shin, Jae-Heon
  • 期刊名称:ETRI Journal
  • 印刷版ISSN:1225-6463
  • 电子版ISSN:2233-7326
  • 出版年度:2012
  • 卷号:34
  • 期号:6
  • 页码:966-969
  • DOI:10.4218/etrij.12.0212.0232
  • 语种:English
  • 出版社:Electronics and Telecommunications Research Institute
  • 摘要:From a practical viewpoint, the topic of electrical stability in oxide thin-film transistors (TFTs) has attracted strong interest from researchers. Positive bias stress and constant current stress tests on indium-gallium-zinc-oxide (IGZO)-TFTs have revealed that an IGZO-TFT with a larger Ga portion has stronger stability, which is closely related with the strong binding of O atoms, as determined from an X-ray photoelectron spectroscopy analysis.
  • 关键词:In-Ga-Zn oxide;IGZO;electrical stability;thin-film transistor;XPS;oxygen binding energy
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