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  • 标题:DC and RF Characteristics of $0.15{\mu}m$ Power Metamorphic HEMTs
  • 本地全文:下载
  • 作者:Shim, Jae-Yeob ; Yoon, Hyung-Sup ; Kang, Dong-Min
  • 期刊名称:ETRI Journal
  • 印刷版ISSN:1225-6463
  • 电子版ISSN:2233-7326
  • 出版年度:2005
  • 卷号:27
  • 期号:6
  • 页码:685-685
  • 语种:English
  • 出版社:Electronics and Telecommunications Research Institute
  • 摘要:DC and RF characteristics of GaAs power metamorphic high electron mobility transistors (MHEMT) have been investigated. The MHEMT device shows a drain saturation current of 480 mA/mm, an extrinsic transconductance of 830 mS/mm, and a threshold voltage of -0.65 V. Uniformities of the threshold voltage and the maximum extrinsic transconductance across a 4-inch wafer were 8.3% and 5.1%, respectively. The obtained cut-off frequency and maximum frequency of oscillation are 141 GHz and 243 GHz, respectively. The MHEMT device shows 33.2% power-added efficiency, an 18.1 dB power gain, and a 28.2 mW output power. A very low minimum noise figure of 0.79 dB and an associated gain of 10.56 dB at 26 GHz are obtained for the power MHEMT with an indium content of 53% in the InGaAs channel. This excellent noise characteristic is attributed to the drastic reduction of gate resistance by the T-shaped gate with a wide head and improved device performance. This power MHEMT technology can be used toward 77 GHz band applications.
  • 关键词:$0.15{\mu}m$;metamorphic HEMT;T-gate
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