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  • 标题:PG2CIF의 개발
  • 本地全文:下载
  • 作者:Kim, Eung-Su ; Lee, Cheol-Dong ; Yu, Yeong-Uk
  • 期刊名称:ETRI Journal
  • 印刷版ISSN:1225-6463
  • 电子版ISSN:2233-7326
  • 出版年度:1985
  • 卷号:7
  • 期号:3
  • 页码:3-11
  • 语种:Korean
  • 出版社:Electronics and Telecommunications Research Institute
  • 摘要:CAD tools that has the common data base system are important to design for the VLSI. Each CAD tools are used to design for the VLSI, and to reduce the complexity, man-error, design-time for the IC design. CIF, a layout description language, was proved to be effective in this point. In this article, the program which translates pattern generation data for the mask tooling into CIF data was described. This program has its character in the unification of physical design data base for a design automated CAD system. The output format of CIF data is fitting to the input of the kgraph that is graphic layout editor, and the name of each layer and the output file is extended as a user's option.
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