期刊名称：Facta universitatis - series: Electronics and Energetics
印刷版ISSN：0353-3670
电子版ISSN：2217-5997
出版年度：2016
卷号：29
期号：1
页码：49-60
DOI：10.2298/FUEE1601049M
出版社：University of Niš
摘要：Our recent research of the effects of pulsed bias NBT stressing in p-channel power VDMOSFETs is reviewed in this paper. The reduced degradation normally observed under the pulsed stress bias conditions is discussed in terms of the dynamic recovery effects, which are further assessed by varying the duty cycle ratio and frequency of the pulsed stress voltage. The results are analyzed in terms of the effects on device lifetime as well. A tendency of stress induced degradation to decrease with lowering the duty cycle and/or increasing the frequency of the pulsed stress voltage, which leads to the increase in device lifetime, is explained in terms of enhanced dynamic recovery effects. [Projekat Ministarstva nauke Republike Srbije, br. OI-171026 i br. TR-32026]
