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  • 标题:Study the Development and Operation of Discrete Vertical Drain Lateral-Diffused MOS (VDMOS) Power Transistors
  • 本地全文:下载
  • 作者:Deepika Sharma ; Bal krishan
  • 期刊名称:International Journal of Innovative Research in Computer and Communication Engineering
  • 印刷版ISSN:2320-9798
  • 电子版ISSN:2320-9801
  • 出版年度:2016
  • 卷号:4
  • 期号:4
  • 页码:6766
  • DOI:10.15680/IJIRCCE.2016.0404069
  • 出版社:S&S Publications
  • 摘要:Dueto scaling limitations, a conventional MOSFET cannot be used in high power applications.So for increasing RF application demand, a MOSFET was created known as VDMOSFET.This paper gives a brief review of VDMOSFET's construction and itsworking.Various parameters affecting its operation havealso been discussed
  • 关键词:VDMOS; Threshold voltage; Gate oxide thickness; Threshold implantation; Channel doping
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