期刊名称：ISPRS Annals of the Photogrammetry, Remote Sensing and Spatial Information Sciences
印刷版ISSN：2194-9042
电子版ISSN：2194-9050
出版年度：2006
卷号：XXXVI Part 5
出版社：Copernicus Publications
摘要：Precise sample stage positioning plays an important role for various FIB (Focused Ion Beam) and SEM (scanning electron microscope) applications in micro - and nanotechnology. During the last few years, FIB instruments have become an indispensable tool for sample preparation, prototyping and micro - machining. Modern FIB devices are equipped with an additio nal electron column. Such combined SEM /FIB devices not only offer the possibility of forming structures by the focused ion beam, but also to almost instantly image the results in a non - destructive manner with the electron probe. Because of the fact that th e ion column and the electron column are located at different positions in respect to each another, the sample has to be orientated normal to the beam by a positioning stage. Within a joint project we investigated the accuracy of SEM/FIB positioning stage operations. Therefore, the repetition uncertainty of the positioning stage was determined by applying photogrammetric methods that were adapted to the micro - range for the geometrical calibration of SEMs, and, by using a special 3D calibration structure wit h control points of approximately 100 nm in diameter (nanomarker). Photogrammetric calibration and analysis of the SEM /FIB system using the nanomarker coordinates worked reliably. The tilting repetition uncertainty of the positioning stage determined by ph otogrammetric self - calibration was less than 0.03 degrees, whereas the rotation repetition uncertainty was less than 0.09 degrees. With the resulting measurement uncertainties, metrological analysis of prototyping and micro - machining processes is possible in future
