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  • 标题:Preparation of Indium Tin Oxide Thin Film by Rapid Thermal Annealing Treatment
  • 本地全文:下载
  • 作者:Sung Jin Kim
  • 期刊名称:International Journal of Innovative Research in Science, Engineering and Technology
  • 印刷版ISSN:2347-6710
  • 电子版ISSN:2319-8753
  • 出版年度:2016
  • 卷号:5
  • 期号:4
  • 页码:6529
  • DOI:10.15680/IJIRSET.2016.0504261
  • 出版社:S&S Publications
  • 摘要:Indium Tin Oxide (ITO) thin films were deposited at room temperature and then annealed by a rapidthermal annealing under different different temperaturefrom 400℃ to 700 ℃for 5min inthe atmosphere of 98%nitrogen + 2% hydrogen ambient gas. In order to know the rapid thermal annealing effect, weinvestigated for theirstructural, optical and electrical properties by using x-ray diffraction and scanning electron microscopy while opticalproperties were studied by the UV transmittance equipment. It is observed that the ITO thin film annealed at 500℃reveals the strong Intensity and narrowest full with at half maximum among the temperature ranges studiedThe uniformity of the electronic properties and the optical properties was also improved
  • 关键词:ITO; rapid thermal annealing; RF magnetron sputtering.
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