Ensuring measurement unity in the field of dimensional nanometrology.
Barsic, Gorana ; Simunovic, Vedran ; Katic, Marko 等
Abstract: The major problem related to ensuring measurement unity
in the field of dimensional nanometrology can be addressed to lack of
norms that defines characteristics of measurement standards for that
field of metrology.
In Laboratory for precise measurements of length (LFSB) significant
efforts have been made in order to investigate metrological
characteristics of standards in the field of micro-and nanometrology. In
this paper we present results of intensive work and research carried out
in LFSB in order to develop standard in the field of dimensional
nanometrology that will significantly contribute to the insurance of
measurement unity in that field of metrology.
Key words: nanometrology, standardization, measurement unity
1. INTRODUCTION
In the last two decades there has been a strong development of
measurement equipment in the area of surface metrology, particularly the
development of scanning microscopes.
Manufacturers of measuring equipment supplies, along with the
instrument, standards that are designed specifically for that measuring
device in order to verify the accuracy and to make calibration of that
instrument. In addition, in the market there are several manufacturers
of standards in the field of dimensional nanometrology. In general,
those standards are intended for individual groups of measuring
instruments, such as interferometric microscopes, stylus instruments,
scanning electron microscopes or scanning probe microscopes. In the
field of micrometrology requirements for the reference standards are
defined by the standard [1]. The above mentioned standard set the
foundation of standardization in the field of micrometrology, while the
assured traceability's are accompanied by the adopted levels of
measurement uncertainties. However, in the area of nanometrology further
intensive work and research is necessary in order to introduce
standardization, and respectively ensure traceability and measurement
unity at the global level.
2. CALIBRATION STANDARDS IN THE FIELD OF MICRO- AND NANOMETROLOGY
As previously discussed, in area of nanometrology special problem
represent the lack of standardization for calibration standards. In
order to list and to make certain systematization of standards used
today in the field of micro- and nanometrology a huge effort is
required. The biggest step in that direction was made by the
Physikalisch-Technische Bundesanstalt (PTB). In their tabulated synopsys
[2] currently available artifacts which may be used as standards and
which are suitable for the calibration of stylus or optical instruments
and SPM's are listed.
Following the overview of standards from [2] a few facts needs to
be pointed out. The first is certainly the choice of materials used for
the structure of standards. In 75% cases it is a silicon or silicon
dioxide.
There is also the common use of coatings, with no material that can
be underlined with respect to its frequency. Materials used as a choice
for coating of Si and Si[O.sub.2] structures are Cr, Ni,
[Si.sub.3][N.sub.4], Pt, Ir, W or Au.
As for measuring structures they are truly diverse and we can found
them in the form of steps, grooves, honeycomb, lattice structure, models
of chess boards or CD replicas, etc. Also reported measuring ranges vary
considerably from standard to standard in vertical, as well as in
lateral directions.
The common characteristic to listed standards is the small
dimensions of the standards themselves. In the case of rectangular form,
lengths of the sides do not usually exceed 10 mm.
But the main rule from the standards overview is that they are
intended only for one type of measuring instruments that are designed
for and as such cannot be measurable on other types of measuring
instruments. So there are standards that are intended solely for
scanning probe microscopes and, because of their miniaturization, they
cannot be used on stylus instruments. Furthermore, there are standards
with measurement area suitable for contact measurements, but do not meet
the requirements for optical measurements or tunneling current
measurements.
3. DEVELOPMENT OF NEW LFSB NANO-ROUGHNESS REFERENCE STANDARD
New LFSB nano-roughness calibration standards have two measurement
areas to ensure the ability to measure the groove depths as well as 2D
and 3D roughness parameters in the field below 50 nm. One surface is a
sequence of rectangular Si[O.sub.2] grooves, while the second
measurement area consists of three wide rectangular Si[O.sub.2] grooves.
Grooves with different lateral sizes are chosen so that the calibration
standard could be measured by different types of instruments.
The size of the probe dimensions were considered in the design of
measurement areas. Both measuring surfaces will have the same nominal
value of the groove depth, thus ensuring link between them. This
characteristic, as far as authors know, makes them unique.
The impact of the measured calibration standard in the uncertainty
budget calculation is one with the most influence. For this reason,
reduction of the measurement area was considered in order to help ensure
better uniformity of standards measuring surfaces.
Since LFSB has more than 20 years of good experience with
Si/Si[O.sub.2] as a material for standard's structures, and the
fact that silicon is today the most used material for calibration
standards in the field of dimensional nanometrology, new LFSB roughness
standards will also be made from silicon.
Due to the transparency and electrical non-conductivity of the
Si[O.sub.2] layer, Si/Si[O.sub.2] structures must be coated with a thin
metallic layer that will provide conditions for optical measurements and
measurements that requires electrical conductivity of the measurement
surface.
Therefore select layer must provide following properties: excellent
mechanical properties; good adhesion; maintain the geometry of the
primary structure of Si/Si[O.sub.2] (same level of deviation from
parallelism and flatness); required optical properties and electrical
conductivity.
Coating with the appropriate material will assure all necessary
conditions for the implementation of a range of different measuring
methods on a single measurement surface. The selected coating material
that has all the necessary properties is chromium.
In cooperation with company MikroMasch Trading OU and Ruder
Boskovic Institute a new roughness reference standards were realized
(Figure 1).
[FIGURE 1 OMITTED]
LFSB has begun with a research of standard's measuring
properties. In order to explore standards an appropriate measurement
were conducted. Standards were measured using the contact profilmeters,
atomic force microscope, interference microscope, ellipsometer and
scanning tunneling microscope (STM). Measurements preformed by use
interference microscope confirmed suitability of measuring surfaces for
optical measurements. The geometry of the interference fringes'
indicate the uniformity of measured Si/Si[O.sub.2] structures (Figure
2).
[FIGURE 2 OMITTED]
Measurements carried out on the profilometers confirmed the
suitability of the measuring surface for the implementation of contact
measurements. A measured profile (Figure 3) shows that a variation of
the profile in the z-axis does not exceed 1.5 nm both inside and outside
of the groove.
[FIGURE 3 OMITTED]
In order to investigate suitability of new roughness reference
standard for measurements that requires electrical conductivity of the
measurement surface, measurement were performed using scanning tunneling
microscope. Figure 4 shows a segment of one groove scanned by STM on the
surface with a sequence of grooves.
[FIGURE 4 OMITTED]
So far conducted measurements of 2D roughness parameters (Ra, Rq,
Rmax and Rz), 3D roughness parameters (Sa, Sq and Sz) as well as groove
depth d measurements indicate the exceptional quality of standard's
measuring features. LFSB will continue with the extensive research of
new roughness reference standards through measurements of groove depths
and 2D and 3D roughness parameters within a comparisons that will
involve a large number of measuring devices i.e. measurement methods.
Further research will focus on exploring measuring surface uniformity in
terms of its applicability for the reproduction of 2D and 3D roughness
parameters in the field below 50 nm.
4. CONCLUSION
Based on the information's from the available scientific
literature in the field nanometrology standards are generally intended
for individual groups of measuring instruments that are designed for and
as such cannot be measured on other types of measuring instruments.
The new LFSB nano-roughness reference standards have two
measurement areas to ensure the ability to measure the groove depth, and
2D and 3D roughness parameters below 50 nm. The high demands on the
uniformity of measuring surfaces are assured by means of planar
technology by forming grooves in silicon dioxide. In order to answer to
the problem of transparency and electrical non-conductivity of the
Si[O.sub.2] grooves, standards were coated with a thin chromium layer.
Thus, realized measuring surface of the new roughness reference
standards provide requirements for contact measurements (high hardness,
good adhesion of the coating), optical measurements (non-transparency,
high reflectivity) and measurements that requires electrically
conductive surface. In that way realized standards are measurable on
almost the entire measuring equipment in the area of nanometrology that
represents a significant contribution to the development of that area.
5. REFERENCES
ISO 5436-1:2000 Geometrical Product Specifications (GPS)--Surface
texture: Profile method; Measurement standards--Part 1: Material
measures
Review of Standards November (2009). Available from:
http://nanoscale.de/standards/techniques.htm
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Strategy for Nanometrology
Bhushan B (Ed.), Handbook of Nano-technology 2nd Edition (2007).
Springer, ISBN 978-3-540-29855-7, New York
Koenders, L.; Dziomba, T.; Thomsen-Schmidt, P. & Wilkening, G.
(2005). Standards for the Calibration of Instruments for Dimensional
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