Atmospheric barrier discharge reactor for surface processing.
Nehra, Vijay ; Kumar, Ashok ; Dwivedi, H.K. 等
Introduction
Since the last decade, plasma assisted surface treatment has been
playing a vital role in the microelectronics industry [1], material
processing [2], textile sector [3-4] and biomedical engineering [5-8].
The remarkable features of cold plasma such as low temperature, presence
of energetic & chemically active species and high chemical
selectivity, which are not attainable by other competing methods, make
cold plasma well-suited in these fields. It provides an environment
friendly and economic way to modify material surfaces at microscopic
level without resorting to mechanical operation or using wet chemicals.
Low pressure glow discharge plasma [9-13] is sustained between two
electrodes extending into a nearly evacuated glass tube. It is produced
at reduced pressure and assures the highest possible uniformity of any
plasma treatment. It is of great interest in fundamental research such
as in the microelectronic industry and material technology but has only
limited applicability in the textile sector. Although with glow
discharges, it is possible in a well controlled and reproducible way to
clean, activate, etch or otherwise modify the surfaces of plastic, metal
or ceramic materials to improve their bonding capabilities or to acquire
totally new surface properties; but the glow discharge plasmas have
never been able to get a foothold in the textile processing sector
because of their fundamental incompatibility and several serious
drawbacks. These plasmas need to be contained in costly air tight
enclosures (massive vacuum reactors) making them highly expensive, time
consuming and impractical to treat work piece by batch processing.
Moreover, the access for observation or sample treatment is limited and
the density of activated particles is also relatively low. Therefore,
recently, there has been a growing interest in the generation and
sustenance of cold plasmas at atmospheric pressure [14-22], mainly
because of non-requirement of a vacuum system, thus leading to high
throughput and cost reduction. In an atmospheric plasma reactor,
continuous processing at the point of manufacture is possible with a
higher activated particle density. In fact, atmospheric plasma
processing has got a rebirth in the textile arena, with the earlier
unsuccessful approach of using vacuum plasmas replaced by novel
atmospheric plasmas reactor. The economic and operational advantages of
operating at elevated pressure at or near 1 atm have led to the
development of a variety of atmospheric plasma based surface treatment
reactors for textile processing applications. Here, efforts have been
made to study design consideration of a continuous process DBD reactor
suitable for textile treatments. System description and process
parameters required for design of DBD setup have been discussed.
Moreover, DBD treatment set up has been presented.
This paper is organized as follows: after a brief introduction in
Section 1, description of plasma generation systems and process
parameters of DBD reactor are presented in Section 2. Further in section
3, DBD treatment setup design is dealt. Section 4 discusses the
industrial applications of the DBD reactor.
Description of plasma generation System
The block diagram layout of typical DBD generation system for
surface modification is shown in figure 1. It consists of five modules:
gas handling system, power supply, impedance matching network, DBD
plasma rector and system controller. For a given plasma generation
system, the outcome of the process is strongly dependent on its process
parameters. The various electrical, kinetic and surface process
parameters playing vital role in the design of DBD assisted plasma
processing have been elaborated in figure 2. The electrical parameters
deal with the selection of suitable DBD reactor geometry, discharge
excitation parameters, power and frequency etc. The kinetic parameters
regulate the gas handling system and consist of a precursor gas supply
of different working media or their combination, depending on the
application. This also consists of mass flow controllers, process
chamber and pressure handling system. The surface parameters deal with
substrate system and include the materials to be processed, such as
conducting or non-conducting substrates, films, fabrics, papers, webs
and two dimensional sheets etc. It also deals with the process
temperature and the position of the substrate.
[FIGURE 1 OMITTED]
[FIGURE 2 OMITTED]
Design of DBD treatment set up
Figure 3 gives a schematic setup of the installation for DBD
reactor. This involves following components, mainly designing of gas
handling system, selection of suitable DBD plasma reactor, power supply
and impedance matching network. Various optional parts may be added in
addition to adapt a base system for different applications or
substrates.
The gas handling system consists of an assembly of ultra-high
purity gas line, which allows controlled entry of gas from high pressure
cylinder to the process chamber. The schematic of gas filling system is
shown in figure 4. The gas handling system consists of suitable gas
cylinders supported by gas plumbing line, valves, mass flow controllers
and necessary accessories. Unique reactions may be promoted by the
appropriate choice of reactant gases and process parameters. Different
gases or a combination of them such as oxidizing gases (O2, air, H2O,
N2), reducing gases, noble gases, active gases, fluorinated gases, and
polymerizing gases etc may be used in plasma processing techniques,
depending upon the desired surface modification. The gas handling system
ensures a regular supply of appropriate working media in the reactor.
[FIGURE 3 OMITTED]
[FIGURE 4 OMITTED]
Further, the DBD reactor can be realized in different geometrical
configurations. In fact, three basic types of DBD arrangements have been
distinguished namely, the classical volume, surface, and coplanar
discharge. The volume discharge configurations in planar geometry are
suitable for continuous processing. The most commonly preferred DBD
reactor configurations [23-30] for surface treatment of films and fibers
include: the planar parallel-plate DBD and cylindrical annulus reactor.
The former is used for fast-moving webs which are not electrostatically
charged and do not adhere to the surface of DBD electrodes over which
they pass. The latter is used for webs which are electrostatically
charged or have high surface energies and adhere to the surface of DBD
electrodes. In this configuration, a rotating drum moves the film or web
through an annulus of DBD plasma generated between a cylindrical
electrode and the drum, while the tension on the film or web is
maintained by idle rollers.
However, planar arrangement may contain either a single dielectric
layer between the two electrodes or on both the electrodes, or in
between two metal electrodes. The plasma is generated between two
parallel plane electrodes contained in a safety enclosure. The high and
low voltage electrodes, both are covered with a dielectric layer. The
height of the plasma discharge gap is adjustable. These reactors are
normally enclosed in a light plastic or a metal sheet chamber.
DBDs exhibit two major discharge [31] modes: either filamentary
mode or homogenous glow discharge. The filamentary mode is the common
form of discharge, comprising of randomly distributed millions of
micro-discharges spread over the electrode surface. The homogenous glow
discharge mode is also known as atmospheric pressure glow discharge
mode. It is suitable for a homogenous treatment of surface or for the
deposition of thin films. The filamentary mode is non-uniform and
creates uneven treatment such as pitting or pin holes. At high power
levels, these pits can burn the surface of the substrate, leaving holes
in the work piece. On the contrary, atmospheric pressure glow discharge
mode offers a uniform and stable surface treatment. It causes less
surface physical damage and is therefore very promising to support
material processing.
Applications of DBD reactor in surface treatment
The DBD reactor may be used in several scientific and industrial
applications such as: surface treatment of textile substrate and for
modifying the surface properties of film, web, fabric, woven and
non-woven textile substrates, polymers for a variety of subsequent
conversion processes such as printing, bonding etc. It may also be
applied to plasma processing of conductive and non conductive films to
increase the surface energy, improve the wettability, wickability,
printability, bonding of fabrics, cleaning and decontamination of
surfaces, adhesion on polymer surfaces and to impart stable change of
surface tension of treated materials.
The surfaces to be treated may be moved continuously and exposed to
the energetic environment of the active species (atoms, radicals,
excited species, and ions) generated in the dielectric barrier
discharge, which produce the desired effect on the surfaces. The dynamic
and energetic environment of DBD plasma interacts with the surfaces of
the substrates to be structured and modifies only the top few nanometer
layers. This allows the surface properties of any material to be changed
without altering or degrading the bulk properties. The chemical
functionality or the morphology of a fiber surface may be altered in
order to impart various specific properties.
Further, this reactor may be used in generation of intensive UV and
VUV photons using noble gases. These UV photon ay be applied in the
field of material processing, in particular, for surface modification,
polymer etching, or alternatively for the deposition of thin metallic
layers and for the polymerization of lacquers.
Conclusion
The DBD reactor design for surface treatment at atmospheric
pressure has been presented. In addition, the major components of this
system i.e. gas filling system, power supply; matching network, DBD
plasma rector, and controller have been discussed along with possible
industrial applications. There is a great potential for DBD reactor in
the future for surface modification as the DBDs produce highly
nonequilibrium plasma conditions in a controllable way at atmospheric
pressure, and at moderate gas temperature. It shows an ease of
flexibility with respect to geometrical shapes, operating medium and
operating parameters. Further, there is also an easy scaling up of
conditions optimized in a small laboratory set up to large industrial
installations. DBD reactor at atmospheric pressure has the possibilities
of replacing the existing batch process and will thus find diverse
applications in various scientific and industrial areas.
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Vijay Nehra (#), Ashok Kumar *, H K Dwivedi ** and Sandeep K. Arya
(#)
(#) Department of Electronics and Communication Engineering, Guru
Jambheshwar University of Science and Technology, Hisar, India Email:
nehra_vijay@yahoo.com
* YMCA Institute of Engineering & Technology, Faridabad, India
** R& D Head (PDP), Samtel Color Limited, Ghaziabad, UP, India