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  • 标题:Thin metalens with high numerical aperture
  • 本地全文:下载
  • 作者:V.V. Kotlyar ; A.G. Nalimov ; S.S. Stafeev
  • 期刊名称:Computer Optics / Компьютерная оптика
  • 印刷版ISSN:0134-2452
  • 电子版ISSN:2412-6179
  • 出版年度:2017
  • 卷号:41
  • 期号:1
  • 页码:5-12
  • 语种:Russian
  • 出版社:Samarskii Natsional'nyi Issledovatel'skii Universitet imeni Akademika S.P. Koroleva,Samara National Research University
  • 摘要:We designed, numerically simulated, fabricated and characterized a thin metalens in an amorphous silicon film. The lens has a diameter of 30 µm, a 633-nm focal length equal to the incident wavelength, a 220-nm period of the subwavelength features, and a 110-nm relief depth. The lens simultaneously controls the phase and polarization of the incident laser light, transforming linear polarization into the radial one and generating a sharp focus. The metalens was fabricated using electron lithography and reactive ion etching. The focal spot obtained from an incident linearly polarized Gaussian beam of wavelength λ measured 0.49λ and 0.55λ on the x- and y-axes. This is a record-breaking focal spot ever obtained using metalenses. Experimental results agree well with the numerically simulated focal spot size of 0.46λ and 0.52λ.
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