摘要：Ta/Nd/NdFeB/Nd/Ta films were deposited by magnetron sputtering on Si (100) substrates and subsequently annealed for 30 min at 923 K in vacuum. It was found that the microstructure and magnetic properties of Ta/Nd/NdFeB/Nd/Ta films strongly depend on the NdFeB layer thickness. With NdFeB layer thickness increasing, both the grain size and the strain firstly reduce and then increase. When NdFeB layer thickness is 750 nm, the strain reaches the minimum value. Meanwhile, both the in-plane and perpendicular coercivities firstly drastically increase and then slowly decrease with NdFeB layer thickness increasing. The highest in-plane and perpendicular coercivities can be obtained at NdFeB layer thickness of 750 nm, which are 21.2 kOe and 19.5 kOe, respectively. In addition, the high remanence ratio (remanent magnetization/saturation magnetization) of 0.87 can also be achieved in Ta/Nd/NdFeB (750 nm)/Nd/Ta film.
