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  • 标题:Extended random sequential adsorption model of irreversible deposition processes: From simulations to experiments
  • 本地全文:下载
  • 作者:P. Lavalle ; P. Schaaf ; M. Ostafin
  • 期刊名称:Proceedings of the National Academy of Sciences
  • 印刷版ISSN:0027-8424
  • 电子版ISSN:1091-6490
  • 出版年度:1999
  • 卷号:96
  • 期号:20
  • 页码:11100-11105
  • DOI:10.1073/pnas.96.20.11100
  • 语种:English
  • 出版社:The National Academy of Sciences of the United States of America
  • 摘要:An experimental study of the irreversible deposition of colloidal particles of various radii R on a solid surface is presented over a wide range of the Peclet number, Pe, or reduced radius R* (Pe = R*4). The experimental data are analyzed by means of a new generalized random sequential adsorption model that takes explicitly the diffusion of the particles during the deposition into account. It allows description of the continuous transition from a random sequential adsorption-like to a ballistic-like deposition behavior. It depends on three parameters: ds, related to the diffusion of the particles before adhesion; ns, related to the number of allowed adhesion trials of a particle; and Re, representing the effective particle radius. The model allows accounting for all of the experimental observations relative to the radial distribution functions and the number density fluctuations over the whole coverage range and all investigated values of R*. In addition, it is found that ds/R is proportional to R*-2 as expected for a diffusional process. Moreover, the parameters ds and ns appear to be connected through the empirical relation (ds/R)ns2/3 = C, where C is found to be of the order of 50. This unique statistical model allows an accurate description of the irreversible deposition process, whatever the influence of gravity with respect to diffusion.
  • 关键词:colloidal particles ; sedimentation ; fluctuation ; radial distribution function
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