摘要：We have fabricated p-type crystalline silicon (Si) solar cells using screen-printing process and investigated their electrical properties. Ph screen printing process led to the uniform formation of n+ emitter. As a result of interaction between Ph-dopant paste and Si substrate, a phosphosilicate glass layer was formed on n+ emitter surface. The current-voltage characteristics were carried out in the temperature range of 175 – 450 K in steps of 25 K. The variation in current level at a particular voltage strongly depended on temperature, indicating that the current transport across the junction was a temperature activated process. The reverse leakage current gradually increased with increasing measurement temperature up to 350 K, above which it rapidly increased. Arrhenius plot of the leakage current revealed that reverse leakage current in low and high temperature regions were dominated by the tunneling mechanism, and generation and recombination mechanism, respectively.
关键词：P-type Si solar cell; screen-printing; I-V; tunneling; generation and recombination; reverse leakage current
