摘要：A novel multi-functional antiferromagnetic coupling layer (MF-AFC) combining Ru and W is revealed to realize an extremely thin (3.8 nm), back-end-of-line compatible as well as magnetically and electrically stable perpendicular synthetic antiferromagnetic layer (pSAF), essential for spintronic memory and logic device applications. In addition to achieving antiferromagnetic RKKY coupling, this MF-AFC also acts as a Boron sink and texture-breaking layer. A detailed optimization of the thickness of the various involved layers has been carried out to obtain extremely thin-pSAF reference layer with stable magnetic properties, which enables the realization of sub-20 nm STT-MRAM cells. Two important advantages are provided by this ultrathin reference layer: the easing of the reference layer etching and the minimization of the dipolar field acting on the storage layer magnetization.
