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  • 标题:Reduction of the forming voltage through tailored oxygen non-stoichiometry in tantalum oxide ReRAM devices
  • 本地全文:下载
  • 作者:Katharina Skaja ; Michael Andrä ; Vikas Rana
  • 期刊名称:Scientific Reports
  • 电子版ISSN:2045-2322
  • 出版年度:2018
  • 卷号:8
  • 期号:1
  • 页码:10861
  • DOI:10.1038/s41598-018-28992-9
  • 语种:English
  • 出版社:Springer Nature
  • 摘要:was found to increase. In-depth XPS analysis connects these observations to a controllable oxygen sub-stoichiometry in the sputter-deposited films. Our analysis shows that the decrease of the forming voltage results from an increase in carrier density in the as-prepared thin-films, which is induced by the presence of oxygen vacancies.
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