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  • 标题:Damage to epitaxial GaN layer on Al2O3 by 290-MeV 238U32+ ions irradiation
  • 本地全文:下载
  • 作者:L. Q. Zhang ; C. H. Zhang ; J. J. Li
  • 期刊名称:Scientific Reports
  • 电子版ISSN:2045-2322
  • 出版年度:2018
  • 卷号:8
  • 期号:1
  • 页码:4121
  • DOI:10.1038/s41598-018-22321-w
  • 语种:English
  • 出版社:Springer Nature
  • 摘要:was produced with increasing ion fluence. Raman scattering spectra show that no N and Ga vacancies were produced, the free-carrier concentration decreases, while its mobility first increases and then exhibits a significant reduction with increasing ion fluence.
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