文章基本信息

标题：STM patterned nanowire measurements using photolithographically defined implants in Si(100)
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作者：A. N. Ramanayaka ; Hyun-Soo Kim ; Ke Tang 等
期刊名称：Scientific Reports
电子版ISSN：2045-2322
出版年度：2018
卷号：8
期号：1
页码：1790
DOI：10.1038/s41598-018-20042-8
语种：English
出版社：Springer Nature
摘要：implanted areas at the ends of the wires. We present detailed results that optimize the spacing of neighboring wires while maintaining electrical isolation after heating to > 1200 °C, a step required for in situ Si surface preparation.