摘要：Exotic pattern formation as a result of drying of an aqueous solution containing DNA and silica nanoparticles is reported. The pattern due to segregation was found to critically depend on the relative ratio of nanoparticles and DNA, as revealed by polarization microscopy, scanning electron microscopy, and fluorescence microscopy. The blurred radial pattern that is usually observed in the drying of a colloidal solution was shown to be vividly sharpened in the presence of DNA. Uniquely curved, crescent-shaped micrometer-scale domains are generated in regions that are rich in nanoparticles. The characteristic segregated patterns observed in the present study are interpreted in terms of a large aspect ratio between the persistence length (∼50 nm) and the diameter (∼2 nm) of double-stranded DNA, and the relatively small silica nanoparticles (radius: 5 nm).
