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  • 标题:Fermi velocity engineering in graphene by substrate modification
  • 本地全文:下载
  • 作者:Choongyu Hwang ; David A. Siegel ; Sung-Kwan Mo
  • 期刊名称:Scientific Reports
  • 电子版ISSN:2045-2322
  • 出版年度:2012
  • 卷号:2
  • 期号:1
  • DOI:10.1038/srep00590
  • 语种:English
  • 出版社:Springer Nature
  • 摘要:

    The Fermi velocity, vF, is one of the key concepts in the study of a material, as it bears information on a variety of fundamental properties. Upon increasing demand on the device applications, graphene is viewed as a prototypical system for engineering vF. Indeed, several efforts have succeeded in modifying vF by varying charge carrier concentration, n. Here we present a powerful but simple new way to engineer vF while holding n constant. We find that when the environment embedding graphene is modified, the vF of graphene is (i) inversely proportional to its dielectric constant, reaching vF ~ 2.5×106 m/s, the highest value for graphene on any substrate studied so far and (ii) clearly distinguished from an ordinary Fermi liquid. The method demonstrated here provides a new route toward Fermi velocity engineering in a variety of two-dimensional electron systems including topological insulators.

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