摘要：Unlike the electrostatic and electromagnetic lenses used in electron microscopy, most X-ray focusing optical systems have fixed optical parameters with constant numerical apertures (NAs). This lack of adaptability has significantly limited application targets. In the research described herein, we developed a variable-NA X-ray focusing system based on four deformable mirrors, two sets of Kirkpatrick-Baez-type focusing mirrors, in order to control the focusing size while keeping the position of the focus unchanged. We applied a mirror deformation procedure using optical/X-ray metrology for offline/online adjustments. We performed a focusing test at a SPring-8 beamline and confirmed that the beam size varied from 108 nm to 560 nm (165 nm to 1434 nm) in the horizontal (vertical) direction by controlling the NA while maintaining diffraction-limited conditions.
