摘要：We have discussed a new crystal epitaxial lateral overgrowth (ELO) method, partly-contacted ELO (PC-ELO) method, of which the overgrowth layer partly-contacts with underlying seed layer. The passage also illustrates special mask structures with and without lithography and provides three essential conditions to achieve the PC-ELO method. What is remarkable in PC-ELO method is that the tilt angle of overgrowth stripes could be eliminated by contacting with seed layer. Moreover, we report an improved monolayer microsphere mask method without lithography of PC-ELO method, which was used to grow GaN. From the results of scanning electron microscopy, cathodoluminescence, x-ray diffraction (XRD), transmission electron microscopy, and atomic force microscope (AFM), overgrowth layer shows no tilt angle relative to the seed layer and high quality coalescence front (with average linear dislocation density <6.4 × 10(3) cm(-1)). Wing stripes peak splitting of the XRD rocking curve due to tilt is no longer detectable. After coalescence, surface steps of AFM show rare discontinuities due to the low misorientation of the overgrowth regions.
