摘要：All-dielectric metamaterials offer a potential low-loss alternative to plasmonic metamaterials at optical frequencies. Here, we experimentally demonstrate a silicon based large-scale magnetic metamaterial, which is fabricated with standard photolithography and conventional reactive ion etching process. The periodically arrayed silicon sub-wavelength structures possess electric and magnetic responses with low loss in mid-infrared wavelength range. We investigate the electric and magnetic resonances dependencies on the structural parameters and demonstrate the possibility of obtaining strong dielectric-based magnetic resonance through a broad band range. The optical responses are quite uniform over a large area about 2 × 2 cm(2). The scalability of this design and compatibility fabrication method with highly developed semiconductor devices process could lead to new avenues of manipulating light for low-loss, large-area and real integrated photonic applications.
