摘要：Confining light into a sub-wavelength area has been challenging due to the natural phenomenon of diffraction. In this paper, we report deep sub-wavelength focusing via dispersion engineering based on hyperbolic metamaterials. Hyperbolic metamaterials, which can be realized by alternating layers of metal and dielectric, are materials showing opposite signs of effective permittivity along the radial and the tangential direction. They can be designed to exhibit a nearly-flat open isofrequency curve originated from the large-negative permittivity in the radial direction and small-positive one in the tangential direction. Thanks to the ultraflat dispersion relation and curved geometry of the multilayer stack, hyperlens can magnify or demagnify an incident beam without diffraction depending on the incident direction. We numerically show that hyperlens-based nanofocusing device can compress a Gaussian beam down to tens-of-nanometers of spot size in the ultraviolet (UV) and visible frequency range. We also report four types of hyperlenses using different material combinations to span the entire range of visible frequencies. The nanofocusing device based on the hyperlens, unlike conventional lithography, works under ordinary light source without complex optics system, giving rise to practical applications including truly nanoscale lithography and deep sub-wavelength scale confinement.
