摘要：Enhanced high-order diffractions which are spatially dispersive are desirable in such as spectroscopy studies, thin-film solar cells, etc. Conventionally, the dielectric gratings can be used to realize the enhanced diffraction, but the facets are usually rugged and optically thick (~μm). Plasmonic materials may exhibit unprecedented ability for manipulating light. Nonetheless, much interest has been focused on the subwavelength metasurfaces working in the zero-order regime. Here, we show that ultra-broadband and strongly enhanced diffraction can be achieved with the super-wavelength metasurfaces. For the purpose, we employ symmetric or asymmetric metal patches on a ground metal plane, which support the localized oscillation of free electrons and enhanced scattering of light. The zero-order reflection is suppressed, giving rise to an enhancement of first-order diffraction (50 ~ 95%) in an ultra-wide bandwidth (600 ~ 1500 nm). The proposed plasmonic structure is planar and ultra-thin (with an etching depth of only 80 nm), showing new potential for constructing compact and efficient dispersive elements.
