首页    期刊浏览 2024年08月24日 星期六
登录注册

文章基本信息

  • 标题:Large spin Hall angle in vanadium film
  • 本地全文:下载
  • 作者:T. Wang ; W. Wang ; Y. Xie
  • 期刊名称:Scientific Reports
  • 电子版ISSN:2045-2322
  • 出版年度:2017
  • 卷号:7
  • 期号:1
  • DOI:10.1038/s41598-017-01112-9
  • 语种:English
  • 出版社:Springer Nature
  • 摘要:We report a large spin Hall angle observed in vanadium films sputter-grown at room temperature, which have small grain size and consist of a mixture of body centered tetragonal (bct) and body centered cubic (bcc) structures. The spin Hall angle is as large as θ V = -0.071 ± 0.003, comparable to that of platinum, θ Pt = 0.076 ± 0.007, and is much larger than that of bcc V film grown at 400 °C, θ V_bcc = -0.012 ± 0.002. Similar to β-tantalum and β-tungsten, the sputter-grown V films also have a high resistivity of more than 200 μΩ∙cm. Surprisingly, the spin diffusion length is still long at 16.3 nm. This finding not only indicates that specific crystalline structure can lead to a large spin Hall effect but also suggests 3d light metals should not be ruled out in the search for materials with large spin Hall angle.
国家哲学社会科学文献中心版权所有