摘要：Possible mechanisms behind the enhanced antimicrobial activity of gallic acid (GA) and its ester propyl gallate (PG) in the presence of UV-A light against Escherichia coli O157:H7 were investigated. GA by itself is a mild antimicrobial and has a pro-oxidant ability. We found that the presence of UV-A light increases the uptake of GA by the bacteria. Once GA is internalized, the interaction between GA and UV-A induces intracellular ROS formation, leading to oxidative damage. Concurrently, GA + UV-A also inhibits the activity of superoxide dismutase (SOD), magnifying the imbalance of redox status of E. coli O157:H7. In addition to ROS induced damage, UV-A light and GA also cause injury to the cell membrane of E. coli O157:H7. UV-A exposed PG caused oxidative damage to the cell and significantly higher damage to the cell membrane than GA + UV-A treatment, explaining its higher effectiveness than GA + UV-A treatment. The findings presented here may be useful in developing new antimicrobial sanitation technologies for food and pharmaceutical industries.
