期刊名称：IOP Conference Series: Earth and Environmental Science
印刷版ISSN：1755-1307
电子版ISSN：1755-1315
出版年度：2019
卷号：267
期号：4
页码：1-7
DOI：10.1088/1755-1315/267/4/042126
出版社：IOP Publishing
摘要：A series of TaN films were coated on Al2O3 at various bias voltages by magnetron sputtering technique. Effect of bias voltage on the microstructure, roughness, deposition rate, binding force of coating-substrate, electrical properties of the TaN coating were investigated by X-ray diffraction (XRD), atomic force microscope (AFM), profile meter, scratch tester and four points probe respectively. The results suggest that the TaN coating were formed by face-center δ-TaN crystals and the preferential orientation of the coatings varied with the bias voltage; the deposition rate and the binding force of coating-substrate reached maximum value of 5.71nm/min and 4.5N when the bias voltage was 80 V, the roughness and the square resistance reached the minimum value of 0.509nm and 15.58Ω/
