首页    期刊浏览 2025年08月02日 星期六
登录注册

文章基本信息

  • 标题:Transport gap in SmB6 protected against disorder
  • 本地全文:下载
  • 作者:Yun Suk Eo ; Yun Suk Eo ; Alexa Rakoski
  • 期刊名称:Proceedings of the National Academy of Sciences
  • 印刷版ISSN:0027-8424
  • 电子版ISSN:1091-6490
  • 出版年度:2019
  • 卷号:116
  • 期号:26
  • 页码:12638-12641
  • DOI:10.1073/pnas.1901245116
  • 出版社:The National Academy of Sciences of the United States of America
  • 摘要:The inverted resistance method was used in this study to extend the bulk resistivity of S m B 6 to a regime where the surface conduction overwhelms the bulk. Remarkably, regardless of the large off-stoichiometric growth conditions (inducing disorder by samarium vacancies, boron interstitials, etc.), the bulk resistivity shows an intrinsic thermally activated behavior that changes ∼7–10 orders of magnitude, suggesting that S m B 6 is an ideal insulator that is immune to disorder.
  • 关键词:topological insulator ; heavy-fermion materials ; semiconductors
国家哲学社会科学文献中心版权所有