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  • 标题:Limitations of Extreme Nonlinear Ultrafast Nanophotonics
  • 本地全文:下载
  • 作者:Christian Kern ; Michael Zürch ; Christian Spielmann
  • 期刊名称:Nanophotonics
  • 印刷版ISSN:2192-8606
  • 电子版ISSN:2192-8614
  • 出版年度:2015
  • 卷号:4
  • 期号:3
  • 页码:303-323
  • DOI:10.1515/nanoph-2015-0013
  • 出版社:Walter de Gruyter GmbH
  • 摘要:High-harmonic generation (HHG) has been established as an indispensable tool in optical spectroscopy. This effect arises for instance upon illumination of a noble gas with sub-picosecond laser pulses at focussed intensities significantly greater than 1012W/cm2. HHG provides a coherent light source in the extreme ultraviolet (XUV) spectral region, which is of importance in inner shell photo ionization of many atoms and molecules. Additionally, it intrinsically features light fields with unique temporal properties. Even in its simplest realization, XUV bursts of sub-femtosecond pulse lengths are released. More sophisticated schemes open the path to attosecond physics by offering single pulses of less than 100 attoseconds duration. Resonant optical antennas are important tools for coupling and enhancing electromagnetic fields on scales below their free-space wavelength. In a special application, placing field-enhancing plasmonic nano antennas at the interaction site of an HHG experiment has been claimed to boost local laser field strengths, from insufficient initial intensities to sufficient values. This was achieved with the use of arrays of bow-tie-shaped antennas of ∼ 100nm in length. However, the feasibility of this concept depends on the vulnerability of these nano-antennas to the still intense driving laser light.We show, by looking at a set of exemplary metallic structures, that the threshold fluence Fth of laser-induced damage (LID) is a greatly limiting factor for the proposed and tested schemes along these lines.We present our findings in the context of work done by other groups, giving an assessment of the feasibility and effectiveness of the proposed scheme.
  • 关键词:high harmonic generation ; plasmonic field enhancement ; ultrafast nanophontonics ; damage threshold ; laser-induced damage ; electron beam lithography
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