摘要：The characteristics of DNA lesions produced by the photoabsorption of phosphorus in yeast cells were studied using monochromatized soft Xrays tuned to the absorption peak of the phosphorus K-edge (2153eV) and below the peak energy (2147 eV). The repaired fractions of DNA double-strand breaks (dsb) were measured relatively by using both a mutant, rad54-3 , which shows the temperature-sensitive dsb repair-deficient phenotype, and a wild-type strain. The repaired fraction of lesion in rad54-3 , which corresponds to the relative yield of dsb reparable by the RAD54 pathway, was not affected by the phosphorus photoabsorption. Repair of the produced lesions in the wild-type cells was also measured by comparing the surviving fraction of the immediately plated cells to that of those cells plated after holding in a non-nutrient medium for 80hrs. The recovery of the surviving fraction after the holding treatment was dependent upon the irradiated X-ray energy. These results suggest that irreparable lesions are produced by the inner-shell photoabsorption of phosphorus in DNA, although its yield is small.
