摘要：Laser irradiation of silica glass is shown to trigger redistribution of material resulting in accumulation of stress and refractive index modification, and the rearrangement of the glass network has a significant impact on the quality of laser written optical components. We propose an alternative laser writing approach for achieving the desired refractive index and optical phase profiles through improved material stress control, demonstrated using both Gaussian and Bessel writing beams. The new material processing strategy is successfully adapted for implementing photonic circuits and diffractive elements with greater efficiency due to improved uniformity and symmetry of the induced index modification.
