摘要：The development of xenon plasma focused ion-beam (Xe PFIB) milling technique enables site-specific sample preparation with milling rates several times larger than the conventional gallium focused ion-beam (Ga FIB) technique. As such, the effect of higher beam currents and the heavier ions utilized in the Xe PFIB system is of particular importance when investigating material properties. To investigate potential artifacts resulting from these new parameters, a comparative study is performed on transmission electron microscopy (TEM) samples prepared via Xe PFIB and Ga FIB systems. Utilizing samples prepared with each system, the mechanical properties of CrMnFeCoNi high-entropy alloy (HEA) samples are evaluated with in situ tensile straining TEM studies. The results show that HEA samples prepared by Xe PFIB present better ductility but lower strength than those prepared by Ga FIB. This is due to the small ion-irradiated volumes and the insignificant alloying effect brought by Xe irradiation. Overall, these results demonstrate that Xe PFIB systems allow for a more efficient material removal rate while imparting less damage to HEAs than conventional Ga FIB systems.
