期刊名称：Chemical Industry and Chemical Engineering Quarterly
印刷版ISSN：1451-9372
出版年度：2017
卷号：23
期号：4
页码：547-562
DOI：10.2298/CICEQ161119008R
出版社：Association of the Chemical Engineers
摘要：A kinetic model for phenol transformation through the UV/H2O2 system was developed and validated. The model includes the pollutant decomposition by direct photolysis and HO•, HO2• and O2 •- oxidation. HO• scavenging effects of CO3 2-, HCO3 -, SO4 2- and Cl- were also considered, as well as the pH changes as the process proceeds. Additionally, the detrimental action of the organic matter and reaction intermediates in shielding UV and quenching HO• was incorporated. It was observed that the model can accurately predict phenol abatement using different H2O2/phenol mass ratios (495, 228 and 125), obtaining an optimal H2O2/phenol ratio of 125, leading to a phenol removal higher than 95% after 40 min of treatment, where the main oxidation species was HO•. The developed model could be relevant for calculating the optimal level of H2O2 efficiently degrading the pollutant of interest, allowing saving in costs and time.
